It is prepared to heat the substrate up to 1000°C with accuracy +/- 1°C. The station includes the substrate (standard up to 6-inch sample holder) positioner and allows precise angular position of the substrate in relation to linear shutter.
The heater material is optimally adapted depending on the customer’s requirements and the specific conditions of the deposition process (e.g. heating temperature, presence of reactive gases). Exemplary heaters: thermocoax, graphite coated with SiC, SiC solid (β).
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Sample holders: PTS, Plate style, Flag style
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Clik here to view. Base pressure: 10-10 mbar (working pressure: ~10-2 mbar)
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